| Title | High Performance Lithographic Hotspot Detection using Hierarchically Refined Machine Learning |
| Author | Duo Ding (Univ. of Texas, Austin, U.S.A.), Andres Torres, Fedor Pikus (Mentor Graphics Corp., U.S.A.), *David Pan (Univ. of Texas, Austin, U.S.A.) |
| Page | pp. 775 - 780 |
| Detailed information (abstract, keywords, etc) | |
| Title | Rapid Layout Pattern Classification |
| Author | *Jen-Yi Wuu (Univ. of California, Santa Barbara, U.S.A.), Fedor G. Pikus, Andres Torres (Mentor Graphics Corp., U.S.A.), Malgorzata Marek-Sadowska (Univ. of California, Santa Barbara, U.S.A.) |
| Page | pp. 781 - 786 |
| Detailed information (abstract, keywords, etc) | |
| Slides | |
| Title | Mask Cost Reduction with Circuit Performance Consideration for Self-Aligned Double Patterning |
| Author | Hongbo Zhang, Yuelin Du, *Martin D. F. Wong (Univ. of Illinois, Urbana-Champaign, U.S.A.), Kai-Yuan Chao (Intel Corp., U.S.A.) |
| Page | pp. 787 - 792 |
| Detailed information (abstract, keywords, etc) | |
| Title | Post-Routing Layer Assignment for Double Patterning |
| Author | *Jian Sun (Fudan Univ., China), Yinghai Lu, Hai Zhou (Northwestern Univ., U.S.A.), Xuan Zeng (Fudan Univ., China) |
| Page | pp. 793 - 798 |
| Detailed information (abstract, keywords, etc) | |
| Slides | |