| Title | Hybrid Lithography Optimization with E-Beam and Immersion Processes for 16nm 1D Gridded Design |
| Author | Yuelin Du, Hongbo Zhang, *Martin D. F. Wong (Univ. of Illinois, Urbana-Champaign, U.S.A.), Kai-Yuan Chao (Intel Corp., U.S.A.) |
| Page | pp. 707 - 712 |
| Detailed information (abstract, keywords, etc) | |
| Title | Design-Patterning Co-optimization of SRAM Robustness for Double Patterning Lithography |
| Author | Vivek Joshi (GLOBALFOUNDRIES, U.S.A.), *Dennis Sylvester (Univ. of Michigan, U.S.A.), Kanak Agarwal (IBM Research, U.S.A.) |
| Page | pp. 713 - 718 |
| Detailed information (abstract, keywords, etc) | |
| Title | Efficient Pattern Relocation for EUV Blank Defect Mitigation |
| Author | Hongbo Zhang, Yuelin Du, *Martin D. F. Wong (Univ. of Illinois, Urbana-Champaign, U.S.A.), Rasit O. Topalaglu (GLOBALFOUNDRIES, U.S.A.) |
| Page | pp. 719 - 724 |
| Detailed information (abstract, keywords, etc) | |
| Title | Character Design and Stamp Algorithms for Character Projection Electron-Beam Lithography |
| Author | Peng Du, Wenbo Zhao, Shih-Hung Weng, *Chung-Kuan Cheng, Ronald Graham (Univ. of California, San Diego, U.S.A.) |
| Page | pp. 725 - 730 |
| Detailed information (abstract, keywords, etc) | |