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The 16th Asia and South Pacific Design Automation Conference

Session 4D  Special Session: Advanced Patterning and DFM for Nanolithography beyond 22nm
Time: 10:20 - 12:20 Thursday, January 27, 2011
Location: Room 416+417
Organizer: David Z. Pan (Univ. of Texas, Austin, U.S.A.)

4D-1 (Time: 10:20 - 10:50)
Title(Invited Paper) All-out Fight against Yield Losses by Design-manufacturing Collaboration in Nano-lithography Era
AuthorSoichi Inoue, Sachiko Kobayashi (Toshiba, Japan)
Pagepp. 395 - 401
Detailed information (abstract, keywords, etc)

4D-2 (Time: 10:50 - 11:20)
Title(Invited Paper) EUV Lithography: Prospects and Challenges
AuthorSam Sivakumar (Intel Corp., U.S.A.)
Pagep. 402
Detailed information (abstract, keywords, etc)

4D-3 (Time: 11:20 - 11:50)
Title(Invited Paper) Future Electron-Beam Lithography and Implications on Design and CAD Tools
AuthorJack J.H. Chen, Faruk Krecinic, Jen-Hom Chen, Raymond P.S. Chen, Burn J. Lin (Taiwan Semiconductor Manufacturing Company, Taiwan)
Pagepp. 403 - 404
Detailed information (abstract, keywords, etc)

4D-4 (Time: 11:50 - 12:20)
Title(Invited Paper) Exploration of VLSI CAD Researches for Early Design Rule Evaluation
AuthorChul-Hong Park (Samsung Electronics, Republic of Korea), David Z. Pan (Univ. of Texas, Austin, U.S.A.), Kevin Lucas (Synopsys, U.S.A.)
Pagepp. 405 - 406
Detailed information (abstract, keywords, etc)