| Title | Flexible Packed Stencil Design with Multiple Shaping Apertures for E-Beam Lithography |
| Author | Chris Chu (Iowa State Univ., U.S.A.), *Wai-Kei Mak (National Tsing Hua Univ., Taiwan) |
| Page | pp. 137 - 142 |
| Detailed information (abstract, keywords, etc) | |
| Slides | |
| Title | Self-Aligned Double Patterning Layout Decomposition with Complementary E-Beam Lithography |
| Author | Jhih-Rong Gao, Bei Yu, *David Z. Pan (Univ. of Texas, Austin, U.S.A.) |
| Page | pp. 143 - 148 |
| Detailed information (abstract, keywords, etc) | |
| Slides | |
| Title | Fixing Double Patterning Violations with Look-Ahead |
| Author | *Sambuddha Bhattacharya, Subramanian Rajagopalan, Shabbir H Batterywala (Synopsys India Pvt., India) |
| Page | pp. 149 - 154 |
| Detailed information (abstract, keywords, etc) | |
| Slides | |
| Title | EUV-CDA: Pattern Shift Aware Critical Density Analysis for EUV Mask Layouts |
| Author | *Abde Ali Kagalwalla (Univ. of California, Los Angeles, U.S.A.), Michael Lam, Kostas Adam (Mentor Graphics, U.S.A.), Puneet Gupta (Univ. of California, Los Angeles, U.S.A.) |
| Page | pp. 155 - 160 |
| Detailed information (abstract, keywords, etc) | |
| Slides | |