| Title | Contact Pitch and Location Prediction for Directed Self-Assembly Template Verification |
| Author | Zigang Xiao, Yuelin Du, *Martin D.F. Wong (Univ. of Illinois, Urbana-Champaign, U.S.A.), He Yi, H.-S. Philip Wong (Stanford Univ., U.S.A.), Hongbo Zhang (Synopsys, U.S.A.) |
| Page | pp. 644 - 651 |
| Detailed information (abstract, keywords, etc) | |
| Slides | |
| Title | Layout Decomposition Co-Optimization for Hybrid E-Beam and Multiple Patterning Lithography |
| Author | *Yunfeng Yang, Wai-Shing Luk (Fudan Univ., China), Hai Zhou (Fudan Univ., China/Northwestern Univ., U.S.A.), Changhao Yan, Xuan Zeng (Fudan Univ., China), Dian Zhou (Fudan Univ, China/Univ. of Texas, Dallas, U.S.A.) |
| Page | pp. 652 - 657 |
| Detailed information (abstract, keywords, etc) | |
| Title | Polynomial Time Optimal Algorithm for Stencil Row Planning in E-Beam Lithography |
| Author | Daifeng Guo, Yuelin Du, *Martin D.F. Wong (Univ. of Illinois, Urbana-Champaign, U.S.A.) |
| Page | pp. 658 - 664 |
| Detailed information (abstract, keywords, etc) | |
| Title | Fast Mask Assignment Using Positive Semidefinite Relaxation in LELECUT Triple Patterning Lithography |
| Author | *Yukihide Kohira (Univ. of Aizu, Japan), Tomomi Matsui (Tokyo Inst. of Tech., Japan), Yoko Yokoyama, Chikaaki Kodama (Toshiba, Japan), Atsushi Takahashi (Tokyo Inst. of Tech., Japan), Shigeki Nojima, Satoshi Tanaka (Toshiba, Japan) |
| Page | pp. 665 - 670 |
| Detailed information (abstract, keywords, etc) | |
| Title | Layout Decomposition for Spacer-is-Metal (SIM) Self-Aligned Double Patterning |
| Author | *Shao-Yun Fang (National Taiwan Univ. of Science and Tech., Taiwan), Yi-Shu Tai, Yao-Wen Chang (National Taiwan Univ., Taiwan) |
| Page | pp. 671 - 676 |
| Detailed information (abstract, keywords, etc) | |
| Slides | |