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The 16th Asia and South Pacific Design Automation Conference

Session 9A  Printability and Mask Optimization
Time: 16:00 - 18:00 Friday, January 28, 2011
Location: Room 411+412
Chairs: Murakata Masami (STARC, Japan), Zheng Shi (Zhejiang Univ., China)

9A-1 (Time: 16:00 - 16:30)
TitleHigh Performance Lithographic Hotspot Detection using Hierarchically Refined Machine Learning
AuthorDuo Ding (Univ. of Texas, Austin, U.S.A.), Andres Torres, Fedor Pikus (Mentor Graphics Corp., U.S.A.), *David Pan (Univ. of Texas, Austin, U.S.A.)
Pagepp. 775 - 780
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9A-2 (Time: 16:30 - 17:00)
TitleRapid Layout Pattern Classification
Author*Jen-Yi Wuu (Univ. of California, Santa Barbara, U.S.A.), Fedor G. Pikus, Andres Torres (Mentor Graphics Corp., U.S.A.), Malgorzata Marek-Sadowska (Univ. of California, Santa Barbara, U.S.A.)
Pagepp. 781 - 786
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9A-3 (Time: 17:00 - 17:30)
TitleMask Cost Reduction with Circuit Performance Consideration for Self-Aligned Double Patterning
AuthorHongbo Zhang, Yuelin Du, *Martin D. F. Wong (Univ. of Illinois, Urbana-Champaign, U.S.A.), Kai-Yuan Chao (Intel Corp., U.S.A.)
Pagepp. 787 - 792
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9A-4 (Time: 17:30 - 18:00)
TitlePost-Routing Layer Assignment for Double Patterning
Author*Jian Sun (Fudan Univ., China), Yinghai Lu, Hai Zhou (Northwestern Univ., U.S.A.), Xuan Zeng (Fudan Univ., China)
Pagepp. 793 - 798
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